Mask superposition for multiple exposures

Details Mask superposition for multiple exposures Mask superposition for multiple exposures

2008-07-01

2008-07-01

Vanore, David A. (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S491100, C250S492100, C250S492200, C250S492300

Reexamination Certificate

active

07394080

ABSTRACT:
An exposure system includes a mask stage module adapted for holding a first mask and a second mask, wherein the first mask is configured for illumination by a first beam to form a transformed first beam having a first pattern from the first mask and the second mask is configured for illumination by a second beam to form a transformed second beam having a second pattern from the second mask. The exposure system also includes a beam combiner configured to combine the transformed first and second beams to form a resultant beam, wherein the resultant beam is projected into a substrate coated with a photoresist layer.

REFERENCES:
patent: 4167676 (1979-09-01), Collier
patent: 4426584 (1984-01-01), Bohlen et al.
patent: 4968893 (1990-11-01), Yasuda et al.
patent: 5087537 (1992-02-01), Conway et al.
patent: 5298365 (1994-03-01), Okamoto et al.
patent: 5552611 (1996-09-01), Enichen
patent: 6137111 (2000-10-01), Yamada et al.
patent: 6222195 (2001-04-01), Yamada et al.
patent: 6403966 (2002-06-01), Oka
patent: 6610988 (2003-08-01), Yamada
patent: 6664011 (2003-12-01), Lin et al.
patent: 7098991 (2006-08-01), Nagasaka et al.
patent: 7177008 (2007-02-01), Nishi et al.
patent: 2003/0072051 (2003-04-01), Myers et al.
patent: 2003/0081192 (2003-05-01), Nishi
patent: 2005/0133732 (2005-06-01), Ohtomo et al.
patent: 2006/0139603 (2006-06-01), Lin
patent: 2007/0003878 (2007-01-01), Paxton et al.

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