Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making named article
Reexamination Certificate
2007-08-14
2007-08-14
McPherson, John A. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making named article
C349S113000, C349S114000
Reexamination Certificate
active
11368196
ABSTRACT:
A substrate is provided with a light reflective film including a base and a reflective layer, in which a plurality of concave portions or convex portions formed on the surface of the base are randomly arranged in the plane direction in 100 to 2,000 RGB dot units or a whole screen unit, are formed using a mask in which light transmissive or non-transmissive portions are randomly arranged in the plane direction in 100 to 2,000 RGB dot units or the whole screen unit.
REFERENCES:
patent: 5408345 (1995-04-01), Mitsui et al.
patent: 5500750 (1996-03-01), Kanbe et al.
patent: 6384886 (2002-05-01), Yamazaki et al.
patent: 6985196 (2006-01-01), Otake et al.
patent: 2001/0010571 (2001-08-01), Kanou et al.
patent: 11-337964 (1999-12-01), None
patent: 2000-2875 (2000-01-01), None
patent: 2000-221494 (2000-08-01), None
patent: 2001-083538 (2001-03-01), None
patent: 2001-201742 (2001-07-01), None
Matsuo Mutsumi
Otake Toshihiro
Tsuyuki Tadashi
Harness & Dickey & Pierce P.L.C.
McPherson John A.
Seiko Epson Corporation
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