Mask, substrate with light reflective film, method for...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making named article

Reexamination Certificate

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C349S113000, C349S114000

Reexamination Certificate

active

11368196

ABSTRACT:
A substrate is provided with a light reflective film including a base and a reflective layer, in which a plurality of concave portions or convex portions formed on the surface of the base are randomly arranged in the plane direction in 100 to 2,000 RGB dot units or a whole screen unit, are formed using a mask in which light transmissive or non-transmissive portions are randomly arranged in the plane direction in 100 to 2,000 RGB dot units or the whole screen unit.

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patent: 6384886 (2002-05-01), Yamazaki et al.
patent: 6985196 (2006-01-01), Otake et al.
patent: 2001/0010571 (2001-08-01), Kanou et al.
patent: 11-337964 (1999-12-01), None
patent: 2000-2875 (2000-01-01), None
patent: 2000-221494 (2000-08-01), None
patent: 2001-083538 (2001-03-01), None
patent: 2001-201742 (2001-07-01), None

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