Mask structure for x-ray exposure and x-ray exposure device and

Details Mask structure for x-ray exposure and x-ray exposure device and Mask structure for x-ray exposure and x-ray exposure device and

1992-12-02

1994-07-26

Porta, David P.

X-ray or gamma ray systems or devices

Specific application

Lithography

378 34, G21K 500

Patent

active

053331672

ABSTRACT:
A mask structure for X-ray exposure comprises a retaining frame, a supporting frame, a mask support and an absorber pattern. The mask structure possesses a function for detecting a state change of the mask structure from its steady state.

REFERENCES:
patent: 4964145 (1990-10-01), Maldonado
patent: 5012500 (1991-04-01), Watanabe et al.
patent: 5042945 (1991-08-01), Shibata et al.
patent: 5048066 (1991-09-01), Fukuda
patent: 5052033 (1991-09-01), Ikeda et al.

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