Mask structure for manufacture of trench type semiconductor...

Details Mask structure for manufacture of trench type semiconductor... Mask structure for manufacture of trench type semiconductor...

2007-04-23

2010-10-05

Garber, Charles D (Department: 2812)

Active solid-state devices (e.g., transistors, solid-state diode

Field effect device

Having insulated electrode

C257SE27091, C257SE29200, C257SE29257, C257SE29260, C257SE21551, C438S242000, C438S246000, C438S424000, C438S514000, C438S700000

Reexamination Certificate

active

07808029

ABSTRACT:
A mask structure and process for forming trenches in a silicon carbide or other wafer, and for implanting impurities into the walls of the trenches using the same mask where the mask includes a thin aluminum layer and a patterned hard photoresist mask. A thin LTO oxide may be placed between the metal layer and the hard photoresist mask.

REFERENCES:
patent: 4420344 (1983-12-01), Davies et al.
patent: 5382541 (1995-01-01), Bajor et al.
patent: 5495441 (1996-02-01), Hong
patent: 5747831 (1998-05-01), Loose et al.
patent: 5827753 (1998-10-01), Huang et al.
patent: 6291918 (2001-09-01), Umeda et al.
patent: 6342430 (2002-01-01), Adams et al.
patent: 6573534 (2003-06-01), Kumar et al.
patent: 2001/0038972 (2001-11-01), Lyons et al.
patent: 2002/0081795 (2002-06-01), Kim et al.
patent: 2003/0003680 (2003-01-01), Raineri et al.
patent: 2003/0032227 (2003-02-01), Ohara et al.
patent: 2003/0045098 (2003-03-01), Verhaverbeke et al.
patent: 2003/0178672 (2003-09-01), Hatakeyama et al.
patent: 2004/0014291 (2004-01-01), Mehrad et al.
patent: 2005/0285271 (2005-12-01), Watanabe
patent: 04243128 (1992-08-01), None

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