Mask structure and mask holding mechanism for exposure apparatus

Details Mask structure and mask holding mechanism for exposure apparatus Mask structure and mask holding mechanism for exposure apparatus

1998-02-25

2000-05-30

Porta, David P.

X-ray or gamma ray systems or devices

Specific application

Lithography

378 35, 216 12, 430 5, H01L 2130

Patent

active

060699310

ABSTRACT:
A mask holding system includes a chucking mechanism for holding a mask structure including a frame and a mask substrate having a rectangular window with a mask pattern, and a load mechanism for applying, at a position along an extension of a diagonal of the rectangular window, a load to the frame in a direction along the plane of the mask, whereby the mask pattern can be distorted isotropically with the application of the load along the mask plane.

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