Radiation imagery chemistry: process – composition – or product th – Imaged product – Multilayer
Reexamination Certificate
2008-03-05
2010-12-21
Chu, John S (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaged product
Multilayer
C430S166000, C430S270100, C430S296000, C430S311000, C430S322000
Reexamination Certificate
active
07855038
ABSTRACT:
Methods of forming an integrated circuit device may include forming a resist pattern on a layer of an integrated circuit device with portions of the layer being exposed through openings of the resist pattern. An organic-inorganic hybrid siloxane network film may be formed on the resist pattern. Portions of the layer exposed through the resist pattern and the organic-inorganic hybrid siloxane network film may then be removed. Related structures are also discussed.
REFERENCES:
patent: 5057396 (1991-10-01), Tanaka et al.
patent: 5200051 (1993-04-01), Cozzette et al.
patent: 6103788 (2000-08-01), Harui et al.
patent: 6110637 (2000-08-01), Sezi et al.
patent: 6171755 (2001-01-01), Elian et al.
patent: 6319853 (2001-11-01), Ishibashi et al.
patent: 6379869 (2002-04-01), Schroeder et al.
patent: 6806027 (2004-10-01), Hohle et al.
patent: 2002/0064958 (2002-05-01), Takeuchi
patent: 2003/0082488 (2003-05-01), Rottstegge et al.
patent: 2003/0207521 (2003-11-01), Tanaka et al.
patent: 2004/0009436 (2004-01-01), Lee et al.
patent: 2004/0018450 (2004-01-01), Fang et al.
patent: 2006/0046205 (2006-03-01), Hah et al.
patent: 2006/0084277 (2006-04-01), Nakashima et al.
patent: 1488995 (2001-04-01), None
patent: 1407116 (2003-04-01), None
patent: 2004-37570 (2004-02-01), None
patent: 2004-093832 (2004-03-01), None
patent: 10-1998-0011721 (1998-04-01), None
patent: 1020000009374 (2000-02-01), None
patent: 10-2001-0037049 (2001-05-01), None
patent: 10-2003-0049198 (2003-06-01), None
patent: 102004005329 (2004-01-01), None
patent: 10-2004-0015955 (2004-02-01), None
patent: 2004-0015955 (2004-02-01), None
patent: 1020040020006 (2004-03-01), None
Korean Intellectual Property Office “Notice to Submit Response” for Korean Appl. No. 10-2004-0076349, issued on Mar. 28, 2006.
Hah Jung-hwan
Hata Mitsuhiro
Kim Hyun-woo
Woo Sang-gyun
Chu John S
Myers Bigel Sibley & Sajovec P.A.
Samsung Electronics Co,. Ltd.
LandOfFree
Mask patterns for semiconductor device fabrication and... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Mask patterns for semiconductor device fabrication and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Mask patterns for semiconductor device fabrication and... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4227320