Mask pattern of a semiconductor device and a method of manufactu

Details Mask pattern of a semiconductor device and a method of manufactu Mask pattern of a semiconductor device and a method of manufactu

1995-09-29

1996-12-17

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430312, 430322, 430394, G03F 900

Patent

active

055852106

ABSTRACT:
A mask pattern for manufacturing a resist pattern of a semiconductor device through photolithography is provided with an additional mask pattern whose size is such that resist patterns are not formed after exposure on the spaces thereof. Using such a mask pattern, a manufacturing method of fine patterns enables the formation of specific patterns having an improved profile.

REFERENCES:
patent: 4767695 (1988-08-01), Ong et al.
patent: 5308741 (1994-05-01), Kemp

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