Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
Reexamination Certificate
2007-10-23
2007-10-23
Nhu, David (Department: 2818)
Semiconductor device manufacturing: process
Chemical etching
Combined with coating step
C438S637000, C438S522000, C257SE21231, C257SE21058, C257SE21218, C257SE21227, C257SE21245
Reexamination Certificate
active
11093840
ABSTRACT:
A mask includes a silicon member, and a portion defining an opening penetrating the silicon member; and the corner of the opening is rounded.
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Harness & Dickey & Pierce P.L.C.
Nhu David
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