Mask, method for manufacturing a mask, method for...

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step

Reexamination Certificate

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Details

C438S637000, C438S522000, C257SE21231, C257SE21058, C257SE21218, C257SE21227, C257SE21245

Reexamination Certificate

active

11093840

ABSTRACT:
A mask includes a silicon member, and a portion defining an opening penetrating the silicon member; and the corner of the opening is rounded.

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