Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2006-08-22
2006-08-22
Rosasco, S. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
Reexamination Certificate
active
07094504
ABSTRACT:
Disclosed is a mask comprising a first area including a first surrounding area in which a halftone phase shift film or a stacked film of a halftone phase shift film and an opaque film is provided on a transparent substrate, and a first opening area surrounded by the first surrounding area, and a second area including a second surrounding area in which a halftone phase shift film is provided on the transparent substrate and a second opening area surrounded by the second surrounding area, wherein a transparent film is provided in at least a part of the second opening area, the transparent film being configured to give a predetermined phase difference to exposure light passing through that part of the second opening area in which the transparent film is provided relative to exposure light passing through the second surrounding area.
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Suwa, K. et al., Automatic Laser Scanning Focus Detection Method Using Printed Focus Pattern, SPIE, vol. 2440, pp. 712-720, (1995).
Inoue Soichi
Ito Shin'ichi
Izuha Kyoko
Kanai Hideki
Kanamitsu Shingo
Finnegan Henderson Farabow Garrett & Dunner L.L.P.
Rosasco S.
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