Mask holding method, mask and mask chuck, exposure apparatus usi

X-ray or gamma ray systems or devices – Specific application – Lithography

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378205, 378208, G21K 500

Patent

active

055442137

ABSTRACT:
V-shaped linear groove portions are formed at regular intervals and at three positions (with 120.degree. pitches) on a periphery, concentric with a ring-shaped support frame, of an X-ray mask to extend in the radial direction. On the other hand, corresponding mounts, as projecting portions, each having a spherical leading end are disposed at three positions on a mask chuck. The mask is held on the mask chuck at the three positions by engaging the corresponding V-shaped linear groove portions and the projecting portions.

REFERENCES:
patent: 4534047 (1985-08-01), Deschenaux et al.
patent: 4610020 (1986-09-01), La Fiandra
patent: 5026239 (1991-06-01), Chiba et al.
patent: 5161177 (1992-11-01), Chiba
patent: 5253012 (1993-10-01), Chiba et al.

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