Mask holding device and method for holding mask

Details Mask holding device and method for holding mask Mask holding device and method for holding mask

1996-09-26

1998-05-12

Fleming, Fritz

Electricity: electrical systems and devices

Electric charge generating or conducting means

Use of forces of electric charge or field

H02N 1300

Patent

active

057515387

ABSTRACT:
A mask holding device of a charged particle beam projecting apparatus for projecting a pattern of a mask on a radiation sensitive substrate by means of a charged particle beam includes an electrostatic chuck for holding the mask, and a conductive member for grounding the mask. The electrostatic chuck has an aperture through which the charged particle beam passes after being transmitted through the mask, and includes an electrode or electrodes for producing an electrostatic force between the mask and the electrostatic chuck so as to attract and hold the mask onto the electrostatic chuck. The conductive member covers at least a portion of the electrostatic chuck which defines the aperture.

REFERENCES:
patent: 3330252 (1967-07-01), Oberg
patent: 4194233 (1980-03-01), Jones et al.
patent: 4502094 (1985-02-01), Lewin et al.
patent: 4692836 (1987-09-01), Suzuki
patent: 4733632 (1988-03-01), Ohmi et al.
patent: 5110438 (1992-05-01), Ohmi et al.
patent: 5189306 (1993-02-01), Frei
patent: 5532903 (1996-07-01), Kendall

Affiliated with

Also associated with

Rating

Mask holding device and method for holding mask does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Mask holding device and method for holding mask, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Mask holding device and method for holding mask will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-988322