Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1986-08-06
1988-01-12
Kittle, John E.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430296, 430325, 430327, 430330, 430966, 430947, 430942, 378 35, G03F 900
Patent
active
047191619
ABSTRACT:
There is disclosed a mask for X-ray lithography wherein a peroxopolytungsten compound is used as an absorber, and a process for producing the same. Since this compound has a sensitivity for electron beams and light and serves as an absorber for X-rays, a mask for X-ray lithorgraphy is made only by applying this compound to a substrate, exposing the same to light to form a transferred pattern, and effecting development. Thus, the step of etching the absorber which is essential in the conventional process, is not needed. Therefore, masks having a highly accurate pattern and few defects can be produced with a high production yield.
Iwayanagi Takao
Kimura Takeshi
Kudo Tetsuichi
Kuniyoshi Shinji
Mochiji Kozo
Dees Jos,e G.
Hitachi , Ltd.
Kittle John E.
LandOfFree
Mask for X-ray lithography and process for producing the same does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Mask for X-ray lithography and process for producing the same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Mask for X-ray lithography and process for producing the same will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-921015