Mask for soft X-rays and method of manufacture

Details Mask for soft X-rays and method of manufacture Mask for soft X-rays and method of manufacture

1977-03-29

1980-04-15

McCamish, Marion E.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156659, 1566591, 428195, 430966, 430 5, H01L 21306

Patent

active

041982630

ABSTRACT:
A mask for soft X-rays comprising a silicon film which permits the penetration of soft X-rays, a soft X-ray mask pattern deposited on one surface of the silicon film, and a supporting member composed of silicon layers and disposed marginally on the other surface of the silicon film, the silicon film being formed on the supporting member by epitaxial growth or impurity diffusion.
A method of making a mask for soft X-rays which comprises the steps of successively forming a first and a second layer on a silicon substrate by epitaxial growth or the like, the first and second layers having different impurity concentrations; forming a soft X-ray mask pattern on the second layer; etching the silicon substrate selectively to remove the silicon substrate except its marginal region; and etching the first layer.

REFERENCES:
patent: 3721593 (1973-03-01), Hays et al.
patent: 3742230 (1973-06-01), Spears
patent: 3767494 (1973-10-01), Muraoka et al.
patent: 3853650 (1974-12-01), Hartlaub
patent: 3941629 (1976-03-01), Kaffe
patent: 3959037 (1976-05-01), Gutierrez et al.
patent: 3959038 (1976-05-01), Gutierrez et al.
patent: 3959045 (1976-05-01), Antypas

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