Mask for sequential lateral solidification (SLS) process and...

Details Mask for sequential lateral solidification (SLS) process and... Mask for sequential lateral solidification (SLS) process and...

2006-07-31

2010-02-23

Wilczewski, M. (Department: 2822)

Semiconductor device manufacturing: process

Formation of semiconductive active region on any substrate

Amorphous semiconductor

C438S166000, C257SE21134, C430S005000, C117S008000, C117S010000

Reexamination Certificate

active

07666767

ABSTRACT:
A mask for sequential lateral solidification (SLS) process with at least one transparency region is provided. The transparent region is defined by two lengthwise edges, a front edge, and a rear edge. The two lengthwise edges also define a quadrilateral. The front edge is located outside the quadrilateral, and the rear edge is located inside the quadrilateral.

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