Mask for sequential lateral solidification (SLS) process and...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer

Reexamination Certificate

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C257SE21561

Reexamination Certificate

active

07902010

ABSTRACT:
A mask for sequential lateral solidification (SLS) processes including at least one first window, one second window, one third window, and one fourth window is provided. Each window has a length extending longitude on the mask. The second window is aligned to the first window. The width of the first window is greater than that of the second window. The fourth window is aligned to the third window. The width of the third window is greater than that of the fourth window.

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patent: 7740993 (2010-06-01), Sun
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patent: 2005/0079693 (2005-04-01), Kang et al.
patent: 1586013 (2005-02-01), None
patent: 1638023 (2005-07-01), None

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