Mask for sequential lateral solidification and method of...

Details Mask for sequential lateral solidification and method of... Mask for sequential lateral solidification and method of...

2006-08-04

2010-11-09

Rosasco, Stephen (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07829245

ABSTRACT:
A mask for sequential lateral solidification capable of preventing pattern deformation that may be caused by laser beam, and a method of manufacturing the same are provided. The mask includes a transparent substrate, and a heat-resistant oxide film pattern, disposed on the transparent substrate, blocking a laser beam.

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patent: 2004/0087116 (2004-05-01), Nakayama
patent: 2006/0024592 (2006-02-01), Kim
patent: 2006/0121369 (2006-06-01), Hwang
patent: 2004-311935 (2004-11-01), None
patent: 10-0484399 (2005-04-01), None
patent: 10-0486676 (2005-04-01), None
Patent Abstracts of Japan, Publication No. 2004-311935, Nov. 4, 2004, 1 p.
Korean Patent Abstracts, Registration No. 10-0484399, Apr. 12, 2005, 1 p.
Korean Patent Abstracts, Registration No. 10-0486676, Apr. 22, 2005, 1 p.

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