Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1985-10-23
1987-12-29
Demers, Arthur P.
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
51301, 118504, 118505, 156654, 20419212, 20419229, 204298, 427 99, 4272481, 427250, 427252, 427272, 427282, C23C 1400
Patent
active
047159405
ABSTRACT:
A shadow mask is provided which can provide a precise patterning to a deposit at process temperature without destruction of the shadow mask itself. The shadow mask consists of a plurality of metallic strips having a series of interconnecting small arched bridges that hold the strips of the mask together. The shadow mask is used in a process for depositing electrode structures in an electroluminescent device wherein the mask is positioned over a substrate surface to be coated and deposit electrode material is sprayed from a geometrically broad source, through the mask and onto the substrate. Deposition occurs beneath the arched bridges resulting in a pattern deposition that does not readily reveal the presence of bridges because sufficient material is coated beneath to provide cosmetic and electrical continuity between areas separated by the bridges. This invention is particularly suited for a mask designed to provide a fine pattern of closely spaced parallel lines or electrode structures.
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Tannas et al., SID 82, Digest 123.
Ingle, Rev. Sci. Inst., 45 (1974) pp. 1460-1461.
Demers Arthur P.
Finnegan Martha Ann
GTE Products Corporation
Jimenez Jose W.
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