Mask for inspecting an exposure apparatus, a method of...

Details Mask for inspecting an exposure apparatus, a method of... Mask for inspecting an exposure apparatus, a method of...

2006-07-04

2006-07-04

Lauchman, Layla G. (Department: 2877)

Optics: measuring and testing

By polarized light examination

C356S399000, C356S401000, C355S053000, C355S055000, C430S005000

Reexamination Certificate

active

07072040

ABSTRACT:
To inspect the polarization state of light flux for exposure of an exposure apparatus, a mask for inspection is held at the photomask position. This mask for inspection comprises a polarizing element which is disposed in a light path of light flux forming an image of a light source and which can selectively transmit light flux with a plurality of polarization directions.

REFERENCES:
patent: 5459000 (1995-10-01), Unno
patent: 6048651 (2000-04-01), Brunner et al.
patent: 6317198 (2001-11-01), Sato et al.
patent: 6884552 (2005-04-01), Mieher et al.
patent: 2836483 (1998-10-01), None
patent: 3246615 (2001-11-01), None

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