Mask for exposing wafer with radiation and its exposing method

Details Mask for exposing wafer with radiation and its exposing method Mask for exposing wafer with radiation and its exposing method

1989-12-08

1992-05-19

Howell, Janice A.

X-ray or gamma ray systems or devices

Specific application

Lithography

378 34, G21K 500

Patent

active

051154560

ABSTRACT:
A mask for exposing a wafer with radiation and its exposition method in which the radiation exposure mask is provided with at least two radiation exposure windows which each include a mask pattern of a smaller pattern area obtained by dividing a pattern area constituting an integrating circuit chip into a plurality of the areas, and a semiconductor wafer is exposed with radiation while the radiation exposure mask is intermittently moved by a distance of the size of the small pattern area.

REFERENCES:
patent: 3742230 (1973-06-01), Spears et al.
patent: 3873824 (1975-03-01), Bean et al.
patent: 3974382 (1976-08-01), Bernacki
patent: 4260670 (1981-04-01), Burns
patent: 4301237 (1981-11-01), Burns
patent: 4881257 (1989-11-01), Nakagawa

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