Mask for etching, and method of making mask and using same

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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Details

430258, 430261, 430320, 430323, 156154, 156240, 156645, 1566591, 156660, 51310, 51312, B44C 122

Patent

active

048348333

ABSTRACT:
A method of etching a surface of an article comprises adhering a negative image bearing film, having a first removable transparent support sheet adhered to an exposure side thereof, to a capillary or second film using a first adhesive. The capillary film has a second removable transparent support sheet adhered to a rear side thereof. A development side of the image bearing film is adhered to a front side of the capillary film opposite the rear side. The first removable transparent support sheet is then removed from the exposure side of the image bearing film and the image bearing and capillary films are sprayed with a solvent which creates a negative image in the capillary film corresponding to the negative image in the negative image bearing film. The two films are thus adhered together and adhered to the second removable transparent support sheet as a mask. The mask is dried and then sprayed with a second adhesive. The second adhesive, when applied to the mask, must have a greater affinity for the surface to which it is to be adhered (i.e. the surface to be etched) than the affinity between the capillary film and the second removable transparent support sheet. The mask is then adhered to the surface of the article and the second removable transparent support sheet is removed from the mask. The mask is then grit blasted so that the image is etched onto the surface in positive. The mask is then removed from the surface.

REFERENCES:
patent: 4193797 (1980-03-01), Cohen et al.
patent: 4430416 (1984-02-01), Goto et al.
patent: 4456680 (1984-06-01), Nakamura et al.
patent: 4587186 (1986-05-01), Nakamura et al.
patent: 4640727 (1987-02-01), Janssen

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