Mask for crystallizing silicon, apparatus having the mask...

Details Mask for crystallizing silicon, apparatus having the mask... Mask for crystallizing silicon, apparatus having the mask...

2006-12-15

2010-10-12

Rosasco, Stephen (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07811721

ABSTRACT:
A mask for crystallizing silicon includes a first, a second, and a third pattern part arranged in a longitudinal direction, each of the first, second, and third pattern parts including a plurality of unit blocks for transmitting and blocking a portion of light. At least two of the first, second and third pattern parts have a corresponding pattern to each other. Advantageously, scans using the aforementioned mask effectively remove a boundary on the silicon formed by the difference in the amount of laser beam irradiation received by the silicon, thereby improving electronic characteristics of the silicon.

REFERENCES:
patent: 2005/0139925 (2005-06-01), You
patent: 1388564 (2003-01-01), None

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