Mask exchanging method and exposure apparatus

Details Mask exchanging method and exposure apparatus Mask exchanging method and exposure apparatus

2005-04-26

2005-04-26

Mathews, Alan (Department: 2851)

Photocopying

Projection printing and copying cameras

Detailed holder for original

C355S053000, C355S077000

Reexamination Certificate

active

06885437

ABSTRACT:
When a reticle stage capable of moving while holding a reticle is at a predetermined unloading position, an unloading arm performs unloading of a reticle. Also, the instant or immediately after the reticle is separated from the reticle stage by the unloading arm, the reticle stage is moved to a predetermined loading position where a reticle is loaded onto the reticle stage by a loading arm. This allows the reticle to be loaded onto the reticle stage before the unloading arm completely withdraws from the unloading position, which reduces the downtime between the retile unloading and the reticle loading. Accordingly, the throughput of the exposure apparatus can be improved, since the time required for reticle exchange is reduced.

REFERENCES:
patent: 4924258 (1990-05-01), Tsutsui
patent: 5442163 (1995-08-01), Nakahara et al.
patent: 6414744 (2002-07-01), Kuiper et al.
patent: 20020024647 (2002-02-01), Nakahara et al.
patent: 1052547 (2000-11-01), None
patent: 2-142112 (1990-05-01), None
patent: 8-293455 (1996-11-01), None
patent: 11-145048 (1999-05-01), None
patent: 11-307425 (1999-11-01), None
Translation of JP 08-293455 cited on PTO-1449, Hidehiko et al., Nov. 5, 1996.*
Translation of JP 11-145048 cited on PTO-1449, Kanefumi., May 28, 1999.*
Translation of JP 11-307425 cited on PTO-1449, Takechika, Nov. 5, 1999.

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