Mask design using library of corrections

Details Mask design using library of corrections Mask design using library of corrections

Filed on

2005-06-29

Date issued

2009-10-13

Examiner

Siek, Vuthe (Department: 2825)

Patent Class

Computer-aided design and analysis of circuits and semiconductor

SubClass

Nanotechnology related integrated circuit design

Other Related Categories

C716S030000, C716S030000, C430S005000, C430S030000, C430S394000

Type

Reexamination Certificate

Status

active

Patent number

07603648

Description

ABSTRACT:
Systems, techniques, and approaches to quickly generate mask patterns, synthesize near-fields, and design masks. In one aspect, a mask may be designed by modeling the transmitted field using a library of corrections and a fast field model.

REFERENCES:
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patent: 2003/0074646 (2003-04-01), Kotani et al.
patent: 2004/0073884 (2004-04-01), Kroyan
“Domain decomposition methods for simulation of printing and inspection of phase defects”; Michael Lam et al.; Department of Electrical Engineering and Computer Sciences, University of CA-Berkeley, Berkeley, CA 94720; mlLam@eecs.berkeley.edu.
“Boundary Layer Model to Account for Thick Mask Effects in PhotoLithography”; Jaione Tirapu-Azpiroz et al.; Electrical Engineering Dept., UCLA, Los Angeles, CA 90095-1594; jaione@ee.ucla.edu.edu.
“Simplified Models for Edge Transitions in Rigorous Mask Modeling”; Konstantinos Adam et al.; EECS Dept., University of CA at Berkeley, Berkeley, CA 94720; kadam@eecs.berkeley.edu.
Fast rigorous three-dimensional mask diffraction simulation using Battle-Lemarie wavelet-based multiresolution time-domain method, M. S. Yeung, Boston Univ. [5040-07] SPIE 2003, vol. 5040, p. 69.
Fast topography simulation using differential method, S. Y. Zinn, S. Kim, S. Choi, J. Sohn, Samsung Electronics Co., Ltd. (South Korea) [5040-09] SPIE 2003, vol. 5040, p. 92.
Rigorous 3D simulation of phase defects in alternating phase-shifting masks. Pistor, T.V.; Proceedings of the SPIE—The International Society for Optical Engineering, vol. 4562, 2002. p. 1038-50. Conference Paper.
Enhancements in rigorous simulation of light diffraction from phase-shift masks. Erdmann, A.; Kachwala, N.; Proceedings of the SPIE—The International Society for Optical Engineering, vol. 4691, 2002. p. 1156-67. Conference Paper.
Metropole-3D: an efficient and rigorous 3D photolithography simulator. Strojwas, A.J.; Li, X.; Lucas, K.D.; IEICE Transactions on Electronics, vol. E82-C, No. 6, Jun. 1999. p. 821-9. Journal Paper.
Lithography simulation employing rigorous solutions to Maxwell's equations. Gordon, R.; Mack, C.A.; Proceedings of the SPIE—The International Society for Optical Engineering, vol. 3334, 1998. p. 176-96. Conference Paper.

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