Mask design using library of corrections

Details Mask design using library of corrections Mask design using library of corrections

2005-06-29

2009-10-13

Siek, Vuthe (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000, C716S030000, C430S005000, C430S030000, C430S394000

Reexamination Certificate

active

07603648

ABSTRACT:
Systems, techniques, and approaches to quickly generate mask patterns, synthesize near-fields, and design masks. In one aspect, a mask may be designed by modeling the transmitted field using a library of corrections and a fast field model.

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