Mask defect inspection data generating method, mask defect...

Details Mask defect inspection data generating method, mask defect... Mask defect inspection data generating method, mask defect...

2008-08-07

2010-06-22

Toatley, Jr., Gregory J (Department: 2877)

Optics: measuring and testing

Inspection of flaws or impurities

Surface condition

C356S239100, C356S239300, C356S237200

Reexamination Certificate

active

07742162

ABSTRACT:
According to a mask defect inspection data generating method, a distance between inspection areas neighboring in a predetermined direction is calculated based on inspection area control information defined in photomask inspection data. It is determined whether or not the calculated distance between inspection areas is less than a predetermined distance. When it is determined that the distance between inspection areas is less than a predetermined distance, the inspection area is combined to produce an optimization inspection area. The produced optimization inspection area information is defined in inspection layout data for making a reference in die-to-database defect inspection.

REFERENCES:
patent: 4532650 (1985-07-01), Wihl et al.
patent: 4930889 (1990-06-01), Van Donselaar et al.
patent: 7289201 (2007-10-01), Matsumoto, Junichi
patent: 2006/0280358 (2006-12-01), Ishikawa
patent: 2006/0292458 (2006-12-01), Tsutsui et al.

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