Mask creation with hierarchy management using cover cells

Details Mask creation with hierarchy management using cover cells Mask creation with hierarchy management using cover cells

2006-06-27

2006-06-27

Siek, Vuthe (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000, C716S030000, C430S005000

Reexamination Certificate

active

07069534

ABSTRACT:
A method and apparatus for translating a hierarchical IC layout file into a format that can be used by a mask writer that accepts files having a limited hierarchy. Cover cells of the original IC layout file or a modified file are designated, and the hierarchical file is redefined to include only those designated cover cells. Non-designated cover cells and other geometric data are flattened into the designated cover cells. The hierarchy of the modified file is then redefined to be less than or equal to the hierarchy limit of the mask writing tool.

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