Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate
2005-08-16
2005-08-16
Do, Thuan (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Nanotechnology related integrated circuit design
C716S030000, C716S030000, C716S030000
Reexamination Certificate
active
06931617
ABSTRACT:
The cost of making a mask set cost has been dramatically increasing due to demand for very small device sizes as well as higher chip complexity. Thus, users would like to minimize the total mask costs. Current logic synthesis tools can create mask designs based on IC characteristics, e.g. speed, area, and power consumption. Therefore, a method of providing a mask design that can be optimized for cost is described. This method includes accessing cells from a library, wherein each cell includes a mask cost metric. Additionally, the weightings of one or more parameters in a constraints listing can be determined. Of importance, at least one parameter relates to mask cost. At this point, logic synthesis can be performed on the design using both the cells and the constraints listing. Advantageously, the resulting synthesized design can be optimized for mask cost.
REFERENCES:
patent: 6388253 (2002-05-01), Su
patent: 2004/0117744 (2004-06-01), Nation et al.
patent: 2004/0128641 (2004-07-01), Broberg et al.
Lippincott Susan Jennifer
Pramanik Dipankar
Sanie Michael
Bever Hoffman & Harms LLP
Do Thuan
Harms Jeanette S.
Synopsys Inc.
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