Electricity: electrical systems and devices – Electric charge generating or conducting means – Use of forces of electric charge or field
Patent
1978-01-30
1980-03-18
Miller, J. D.
Electricity: electrical systems and devices
Electric charge generating or conducting means
Use of forces of electric charge or field
269 20, 355132, H02N 1300
Patent
active
041942337
ABSTRACT:
There is described a unique apparatus which is especially useful with very thin masks used in X-ray lithography, transmission electron lithography or electron projection lithography. The apparatus includes temperature stabilization means for counteracting the deleterious effects in the mask caused by absorption of energy from the energy source as well as positioning means for precisely spacing thin masks for proximity lithography techniques. The thermal effects are counteracted by providing a chuck which supports the substrate to be acted upon. A thermally conductive layer, for example a fluid or other conformable medium, can be provided between the substrate and the chuck. The mask is similarly spaced from the substrate by a thin layer of thermally conductive material, for example, a low pressure gas which is capable of passing the energy in question. The precise spacing of the mask is controlled by the use of a source which establishes an electrostatic charge between the substrate and the mask. The charge may be provided by a source connected to the substrate and mask or by means of filaments disposed above the mask. Precise spacing is achieved by balancing the attractive force of the electrostatic charge with the repulsive force of the low pressure gas.
REFERENCES:
patent: 4007987 (1977-02-01), Sheets
patent: 4026653 (1977-05-01), Appelbaum et al.
patent: 4054383 (1977-10-01), Lin et al.
patent: 4139051 (1979-02-01), Jones et al.
Jones Addison B.
Wittry David B.
Hamann H. Fredrick
Miller J. D.
Rockwell International Corporation
Schroeder L. C.
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