Mask and manufacturing method of a semiconductor device and...

Details Mask and manufacturing method of a semiconductor device and... Mask and manufacturing method of a semiconductor device and...

2005-12-14

2008-11-11

Lindsay, Jr., Walter (Department: 2812)

Semiconductor device manufacturing: process

Making device or circuit emissive of nonelectrical signal

Including integrally formed optical element

C438S030000, C438S384000, C438S758000, C257SE31041, C257SE29117, C257SE27100

Reexamination Certificate

active

07449352

ABSTRACT:
An exposure mask is provided, which includes: a light blocking opaque area blocking incident light; a translucent area; and a transparent area passing the most of incident light, wherein the translucent area generates the phase differences in the range of about −70° to about +70°.

REFERENCES:
patent: 5543252 (1996-08-01), Shibata et al.
patent: 5902493 (1999-05-01), Bae
patent: 5916712 (1999-06-01), Miyashita et al.
patent: 6300035 (2001-10-01), Thackeray et al.
patent: 2003/0186135 (2003-10-01), Nakagawa et al.
patent: 2007/0064185 (2007-03-01), Kim et al.
patent: 7-043888 (1995-02-01), None
patent: 8-106151 (1996-04-01), None
patent: 8-272073 (1996-10-01), None
patent: 9-061990 (1997-03-01), None
patent: 10-083062 (1998-03-01), None
patent: 10-148926 (1998-06-01), None
patent: 2003-195479 (2003-07-01), None
patent: 10-1998-0010601 (1998-04-01), None
patent: 10-1998-0033964 (1998-08-01), None
patent: 10-1998-0068443 (1998-10-01), None
patent: 10-2000-0041410 (2000-07-01), None
patent: 10-2001-0075777 (2001-08-01), None
patent: 10-2002-0065081 (2002-08-01), None
patent: 10-2003-0084781 (2003-11-01), None
patent: 10-2004-0019601 (2004-03-01), None
patent: 10-2004-0035486 (2004-04-01), None
patent: 10-2004-0068863 (2004-08-01), None

Affiliated with

Also associated with

Rating

Mask and manufacturing method of a semiconductor device and... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Mask and manufacturing method of a semiconductor device and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Mask and manufacturing method of a semiconductor device and... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4044335