Manufacturing process of aluminum support for planographic...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C430S278100, C430S286100, C430S302000, C430S309000, C430S494000, C430S944000, C430S945000

Reexamination Certificate

active

11055138

ABSTRACT:
A process for manufacturing an aluminum support for a planographic printing plate material, the process containing the steps of: (a) electrolytically surface-roughening an aluminum plate in an electrolyte solution containing hydrochloric acid as a main component; and (b) anodizing the surface-roughened aluminum plate, wherein the step (a) contains: (i) a first stage which surface-roughens the aluminum plate employing a sine-wave alternating current; and (ii) a second stage which surface-roughens the aluminum plate employing a controlled sine-wave alternating current using a thyristor so that a current flow starts at a phase angle of 60 to 120 degree of an alternating current cycle.

REFERENCES:
patent: 4294672 (1981-10-01), Ohba et al.
patent: 6103087 (2000-08-01), Mori
patent: 2003/0031860 (2003-02-01), Hotta et al.
patent: 2004/0055490 (2004-03-01), Sampei
patent: 2005/0153242 (2005-07-01), Takagi

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Manufacturing process of aluminum support for planographic... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Manufacturing process of aluminum support for planographic..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Manufacturing process of aluminum support for planographic... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3736098

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.