Manufacturing method of transflective LCD and transflective...

Liquid crystal cells – elements and systems – Particular structure – Having significant detail of cell structure only

Reexamination Certificate

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C349S114000, C349S147000, C349S149000

Reexamination Certificate

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07545474

ABSTRACT:
A manufacturing method of a transflective LCD comprising forming a multiple layer on a substrate by depositing transparent electrode layer and a gate metal layer sequentially, forming a gate line, a gate electrode, a gate pad forming part and a data pad forming part by patterning the multiple layer, forming a gate insulating layer, forming a semiconductor layer, forming a data line, a source electrode and a drain electrode, forming a passivation layer and an organic insulating layer and forming a gate pad and a data pad by providing contact holes exposing the transparent electrode layer on the gate pad forming part and the data pad forming part, respectively. Accordingly, it is an aspect of the present invention to provide a manufacturing method of a transflective LCD using less masks and a transflective LCD thereof.

REFERENCES:
patent: 5828433 (1998-10-01), Shin
patent: 6683666 (2004-01-01), Jang et al.
patent: 2003/0197181 (2003-10-01), Yun
patent: 2003/0197187 (2003-10-01), Kim et al.
patent: 2004/0032550 (2004-02-01), Anno et al.
patent: 2005/0078264 (2005-04-01), Yoo et al.

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