Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal
Reexamination Certificate
2008-05-13
2008-05-13
Le, Dung A. (Department: 2818)
Semiconductor device manufacturing: process
Making device or circuit emissive of nonelectrical signal
C438S023000, C438S030000, C438S048000, C438S508000
Reexamination Certificate
active
07371592
ABSTRACT:
A method for manufacturing a thin film transistor array panel using a photo mask is provided. The photo mask includes: a transmitting area and a translucent area, wherein the translucent area includes a plurality of light blocking portions blocking light, and wherein the light blocking portions have a plurality of areas blocking different amounts of light. By using this type of photo mask, a substantially flat layer of photoresist film can be deposited even on top of an uneven surface to manufacture a thin film transistor array panel. The flat photoresist film reduces processing cost and enhances the reliability of the panel manufacturing process.
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Jeon Woo-Seok
Jung Doo-hee
Kim Joo-Han
Lee Hi-Kuk
Park Jeong-Min
Le Dung A.
MacPherson Kwok & Chen & Heid LLP
Samsung Electronics Co,. Ltd.
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