Manufacturing method of substrate having conductive layer...

Details Manufacturing method of substrate having conductive layer... Manufacturing method of substrate having conductive layer...

2005-12-07

2008-11-11

Lebentritt, Michael S. (Department: 2829)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

On insulating substrate or layer

C048S053300, C257SE21259, C257SE21266, C257SE21493

Reexamination Certificate

active

07449372

ABSTRACT:
The manufacturing method of a substrate having a conductive layer has the steps of: forming an inorganic insulating layer over a substrate; forming an organic resin layer with a desired shape over the inorganic insulating layer; forming a low wettability layer with respect to a composition containing conductive particles on a first exposed portion of the inorganic insulating layer; removing the organic resin layer; and coating a second exposed portion of the inorganic insulating layer with a composition containing conductive particles and baking, thereby forming a conductive layer.

REFERENCES:
patent: 6734029 (2004-05-01), Furusawa
patent: 6861279 (2005-03-01), Nakanishi et al.
patent: 7018872 (2006-03-01), Hirai et al.
patent: 2002/0151161 (2002-10-01), Furusawa
patent: 2005/0112810 (2005-05-01), Kobayashi
patent: 2003-209339 (2003-07-01), None
patent: 2004-087977 (2004-03-01), None

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