Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making named article
Reexamination Certificate
2004-08-31
2008-09-02
McPherson, John A. (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making named article
C264S001100, C427S162000, C427S355000
Reexamination Certificate
active
07419770
ABSTRACT:
A manufacturing method of an optical device having a micro-asperity pattern that has various kinds of accurate three-dimensional shapes and is realized as thin films includes: a first step of coating a substrate with a resin thin film made of a photosensitive resin; a second step of forming a material-property-changed part at a part of the resin thin film by photolithography; a third step of controlling a temperature of the resin thin film to be a temperature that is lower than a photosensitivity extinction temperature or a hardening reaction starting temperature of the resin thin film; a fourth step of pressing a die having a micro-asperity pattern against the surface of the resin thin film to form a first micro-asperity pattern in a state in which the resin thin film has been softened or melted; and a fifth step of forming a second micro-asperity pattern at a part of the resin thin film by removing the material-property-changed part.
REFERENCES:
patent: 6759182 (2004-07-01), Ikeda
patent: 2002/0125588 (2002-09-01), Ikeda et al.
patent: 2003/0086036 (2003-05-01), Yang et al.
patent: 2002-268057 (2002-09-01), None
Aoyama Shigeru
Ikeda Masaaki
McPherson John A.
OMRON Corporation
Osha•Liang LLP
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