Manufacturing method of micro-electro-mechanical device

Details Manufacturing method of micro-electro-mechanical device Manufacturing method of micro-electro-mechanical device

2006-07-11

2010-10-26

Fulk, Steven J (Department: 2891)

Semiconductor device manufacturing: process

Making device or circuit responsive to nonelectrical signal

Physical stress responsive

C257S419000, C257SE29167

Reexamination Certificate

active

07820470

ABSTRACT:
A method of forming a microstructure body and a semiconductor element for controlling the microstructure body over the same substrate to reduce manufacturing cost, for mass-production of micromachines having a microstructure. In manufacturing a micromachine, a sacrifice layer is formed using a mask material for forming a pattern of a film, and removal of the mask in a region for forming a semiconductor element and removal of the sacrifice layer and the mask in a region for forming a microstructure body are performed by the same step. Specifically, a manufacturing method of a micro-electro-mechanical device is provided wherein a sacrifice layer is selectively formed over an insulating substrate, a semiconductor layer is formed to cover the sacrifice layer, a mask is formed over the semiconductor layer, the semiconductor layer is etched using the mask, and the mask and the sacrifice layer are removed by the same step.

REFERENCES:
patent: 5971355 (1999-10-01), Biegelsen et al.
patent: 6452238 (2002-09-01), Orcutt et al.
patent: 6614054 (2003-09-01), Ahn
patent: 6806654 (2004-10-01), Shannon
patent: 6813054 (2004-11-01), Aksyuk et al.
patent: 6860939 (2005-03-01), Hartzell
patent: 6940564 (2005-09-01), Murden et al.
patent: 6969630 (2005-11-01), Ozgur
patent: 2001/0023010 (2001-09-01), Yamada et al.
patent: 2002/0075094 (2002-06-01), Bechtle et al.
patent: 2003/0215974 (2003-11-01), Kawasaki et al.
patent: 2005/0001701 (2005-01-01), Shirakawa
patent: 2005/0003566 (2005-01-01), Yamamoto
patent: 2005/0077612 (2005-04-01), Nikkel et al.
patent: 2005/0190023 (2005-09-01), Nakatani et al.
patent: 2005/0205515 (2005-09-01), Saga et al.
patent: 2005/0218488 (2005-10-01), Matsuo
patent: 2005/0225921 (2005-10-01), Nakatani et al.
patent: 2005/0275072 (2005-12-01), Haluzak et al.
patent: 2006/0087716 (2006-04-01), Kweon et al.
patent: 2006/0181368 (2006-08-01), Naniwada
patent: 2006/0210106 (2006-09-01), Pedersen
patent: 2006/0218785 (2006-10-01), Horiuchi et al.
patent: 2006/0270238 (2006-11-01), Izumi et al.
patent: 2001-144117 (2001-05-01), None
patent: 2004-001201 (2004-01-01), None
patent: 2004-133281 (2004-04-01), None

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