Etching a substrate: processes – Forming or treating article containing a liquid crystal...
Patent
1994-07-27
1996-01-09
Powell, William
Etching a substrate: processes
Forming or treating article containing a liquid crystal...
216 33, 216 65, C30B 3300, B44C 122
Patent
active
054821738
ABSTRACT:
A method for manufacturing a LCD device includes forming a first electrode on a lower substrate so as to be connected with an external terminal on the periphery of the lower substrate and forming a liquid crystal cell on a central portion of the lower substrate. A passivation layer is thereafter formed on the overall surface of the lower substrate. A first portion of the passivation layer which overlies a contact area of the first electrode is then removed using a laser beam directed through the lower substrate at the contact area of the first electrode and the overlying passivation layer. A conductive layer of paste is formed on the contact area of the first electrode, either before or after the removal of the first portion of the passivation layer, and an upper substrate is assembled to the lower substrate so that the conductive layer forms an electrical connection between the first electrode and a common electrode formed on an inner surface of the upper substrate.
REFERENCES:
patent: 4970369 (1990-11-01), Yamazaki et al.
patent: 4975145 (1990-12-01), Yamazaki et al.
Kim Dong-gyu
Kim Sang-soo
Park Woon-Yong
Donohoe Charles R.
Powell William
Samsung Electronics Co,. Ltd.
Whitt Stephen R.
LandOfFree
Manufacturing method of forming a passivation layer in a liquid does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Manufacturing method of forming a passivation layer in a liquid , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Manufacturing method of forming a passivation layer in a liquid will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1297678