Manufacturing method of display device and exposure system...

Details Manufacturing method of display device and exposure system... Manufacturing method of display device and exposure system...

2007-07-24

2010-02-02

Sefer, A. (Department: 2893)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

On insulating substrate or layer

C257S059000, C257S072000, C257SE33001, C349S129000

Reexamination Certificate

active

07655510

ABSTRACT:
A display panel manufacturing method in which forming a thin film on a substrate and etching the thin film are repeated a plurality of times to form on the substrate a plurality of scanning signal lines, a plurality of video signal lines that three-dimensionally intersects the plurality of scanning signal lines with an insulating layer between them, and TFT elements and pixel electrodes each disposed in a pixel area enclosed with two adjacent scanning signal lines and two adjacent video signal lines. The method also includes: exposing a resist film using exposure dimensions numerically expressed based on design patterns prepared in advance; etching the thin film using etching resists formed by developing the exposed resist film so as to form thin-film patterns; and correcting the design patterns according to the complete dimensions of the formed thin-film patterns.

REFERENCES:
patent: 2006/0220024 (2006-10-01), Ohara et al.

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