Manufacturing method of a thin film resistor

Details Manufacturing method of a thin film resistor Manufacturing method of a thin film resistor

1994-06-24

1995-04-04

Thomas, Tom

Fishing, trapping, and vermin destroying

437195, 437918, H01L 2190

Patent

active

054037689

ABSTRACT:
A manufacturing method for a thin film resistor is disclosed. An insulating layer is formed on a substrate having a contact region. The insulating layer above the contact region is removed by etching to expose the contact region. A metal layer and an interlayer are then formed in sequence on the surface of the structure. The metal layer and the interlayer above the region where the resistor will be formed is next removed, and then a resistor layer is formed on the surface of the structure. The thin film resistor is completed by etching away the resistor layer except for the predetermined region where the resistor is to be formed.

REFERENCES:
patent: 4785342 (1988-11-01), Yamanaka et al.
patent: 4874719 (1989-10-01), Kurosawa
patent: 5151376 (1992-09-01), Spinner, III
patent: 5177030 (1993-01-01), Lee et al.

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