Manufacturing method of a display device using a two-layered...

Details Manufacturing method of a display device using a two-layered... Manufacturing method of a display device using a two-layered...

2006-07-10

2008-12-02

Smith, Matthew (Department: 2823)

Liquid crystal cells, elements and systems

Particular excitation of liquid crystal

Electrical excitation of liquid crystal

C257S057000, C257S059000

Reexamination Certificate

active

07460189

ABSTRACT:
The present invention realizes the two-layered resist structure for obtaining a half exposure pattern of high sensitivity and high accuracy and a manufacturing method of a display device which includes thin film transistors which are formed using the two-layered resist. The resist is constituted of five layers, that is, a base film, a cushion layer, an upper-layer resist, a lower-layer resist and a cover film. Thicknesses of these structural members are set such that base film has a thickness of 50 to 100 μm, the cushion layer has a thickness of 10 to 30 μm, the upper-layer resist has a thickness of 0.5 to 1.0 μm, the lower-layer resist has a thickness of 0.5 to 1.0 μm, and the cover film has a thickness of 10 to 30 μm.

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