Manufacturing method for ink jet recording head chip, and...

Details Manufacturing method for ink jet recording head chip, and... Manufacturing method for ink jet recording head chip, and...

2007-02-27

2010-11-02

Alanko, Anita K (Department: 1713)

Etching a substrate: processes

Etching of semiconductor material to produce an article...

C216S027000, C219S121690

Reexamination Certificate

active

07824560

ABSTRACT:
A manufacturing method for a substrate for an ink jet head, including formation of an ink supply port in a silicon substrate, the method includes a step of forming, on one side of the substrate, an etching mask layer having an opening at a position corresponding ink supply port; a step of forming unpenetrated holes through the opening of the etching mask layer in at least two rows in a longitudinal direction of the opening; and a step of forming the ink supply port by crystal anisotropic etching of the substrate in the opening.

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