Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate
2007-10-02
2007-10-02
Le, Thao P. (Department: 2818)
Semiconductor device manufacturing: process
Coating with electrically or thermally conductive material
To form ohmic contact to semiconductive material
C438S103000, C438S108000, C438S613000, C257S777000, C257SE21021
Reexamination Certificate
active
10724202
ABSTRACT:
A semiconductor bear chip having a bump subjected to high temperatures is pressed, from the upper side, onto a wiring board including a wiring pattern, a thermosetting resin film covering an electrode area on the wiring pattern and having insulating particles dispersed and included and a thermoplastic resin film covering the thermosetting resin film, while applying a ultrasonic wave, thereby inserting the bumps of the semiconductor bear chip through the thermoplastic resin film and the thermosetting resin film to bond the top end portion of the bump with the electrode area.
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Kisker-Biotech: “Microparticles”, Dec. 25, 2001, XP002418558, 9 pages.
Kawai Wakahiro
Sato Noriaki
Dickstein & Shapiro LLP
Le Thao P.
Omron Corporation
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