Manufacture of phenyl ethylamine compounds, in particular...

Details Manufacture of phenyl ethylamine compounds, in particular... Manufacture of phenyl ethylamine compounds, in particular...

2006-04-11

2006-04-11

Barts, Samuel (Department: 1621)

Organic compounds -- part of the class 532-570 series

Organic compounds

Amino nitrogen containing

Reexamination Certificate

active

07026513

ABSTRACT:
A process for the preparation of hydroxy(cycloalkane/cyclokene) phenylethyl amine of the general formula (III) comprising alkylation of its precursor amine of general formula (II) which is in turn produced by an effective reduction process from its precursor cyanide having the general formula (I) using Raney Nickel (CORMIII) as catalyst where, either of R5 and R6 independently could be in meta or para position and R5, R6 are independently hydrogen, hydroxyl, alkyl, alkanoyloxy, cyano, nitro, alkylmercapto, amino, alkylamino, allkanamido, halo, trifluoromethyl, or taken together methylenedioxy, n is 0, 1, 2, 3, 4, R7 is hydrogen of alkyl of 1–7 carbon atom, R1 IH or alkyl of 1–3 carbon atom and R2 is alkyl 1–3 carbon atom, the dotted line represents optional unsaturation. Compounds of formulae IV, V and VI are respectively derivatives of compounds I, II and III respectively.

REFERENCES:
patent: 2462736 (1949-02-01), Gresham
patent: 4535186 (1985-08-01), Husbands
patent: 6350912 (2002-02-01), Chavan
W.E. Fristad et al., Manganese(III) gamma-Lactone Annulation with Substituted Acids, J. org. Chem., 1985, 50(17)3143-3148.

Affiliated with

Also associated with

Rating

Manufacture of phenyl ethylamine compounds, in particular... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Manufacture of phenyl ethylamine compounds, in particular..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Manufacture of phenyl ethylamine compounds, in particular... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3615672