Manufacture of carbon substrate for magnetic disk

Details Manufacture of carbon substrate for magnetic disk Manufacture of carbon substrate for magnetic disk

1993-03-19

1994-06-21

Powell, William

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156626, 156654, B44C 122

Patent

active

053225953

ABSTRACT:
Disclosed is a method of manufacturing a carbon substrate for a magnetic disk capable of increasing the treatment rate leading to a lowering of the manufacturing cost, reducing the variation of the surface roughness of each substrate, and the variation of the surface roughness among the substrates in each lot. The surface of a carbon substrate is roughened to have a surface roughness Ra of 10-500 .ANG. by dry etching. The examples of the dry etching methods include chemical dry etching, barrel etching, plasma etching, RIE, RIBE, and ion milling.

REFERENCES:
patent: 4802951 (1989-02-01), Clark
patent: 5006203 (1991-04-01), Purdes
patent: 5022959 (1991-06-01), Itoh et al.
patent: 5166006 (1992-11-01), Lal et al.

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