Manufacture of an infra-red detector element, and detection elem

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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Details

156643, 204192E, 29572, 250211R, 250338, H01L 3102, C23C 1500, H01L 3118

Patent

active

043216153

ABSTRACT:
The manufacture of an infra-red radiation detector element (51). A body of infra-red sensitive material (e.g. cadmium mercury telluride) secured to a substrate (22) is subjected to ion-etching to remove part of the material over the whole thickness of the element (51) at areas (56) between the contact areas of the element electrodes (35 and 36b) so as to define a current path between these electrodes (35 and 36b) which extends through the remaining material and is longer than the distance along a straight line between the electrodes (35 and 36b). This longer current path increases the charge-carrier transit time and resistance between the electrodes (35 and 36b) so that the responsivity of the detector element (51) can be improved while still producing a compact element structure because of the advantages of defining the current path by ion-etching. This etch-removal may involve forming parallel slots (56) which extend from opposite side walls of the element (51) to define a meandering current path, and may additionally be used to form a mutual separation (55) between portions (51 and 52) of the body each of which is to form a separate infra-red detector element of an array formed on the substrate (22).

REFERENCES:
patent: 3989946 (1976-11-01), Chapman et al.
patent: 4029962 (1977-06-01), Chapman
patent: 4128467 (1978-12-01), Fischer
patent: 4258254 (1981-03-01), Elliott

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