Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Reexamination Certificate
2006-01-31
2008-03-11
Chea, Thorl (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
C430S320000, C428S041800
Reexamination Certificate
active
07341824
ABSTRACT:
A system and method are provided for fabricating an orifice plate for use in an ink jet printing system. Initially, a substrate base is provided, and a controlled-release layer is applied to a surface of the substrate base. A conductive metal layer is adherently coated on the controlled-release layer. At least one dielectric peg is created on a portion of the conductive metal layer, and a nozzle layer is applied on the conductive metal layer to partially cover the dielectric peg. A trench is formed that covers a nozzles prior to formation of a reinforcing layer. The controlled-release layer is removed to separate the orifice plate from the substrate base. The conductive metal layer is selectively etched from the nozzle layer to complete fabricating the orifice plate.
REFERENCES:
patent: 4268610 (1981-05-01), Roos
patent: 4773971 (1988-09-01), Lam et al.
patent: 4972204 (1990-11-01), Sexton
patent: 5277783 (1994-01-01), Ohashi et al.
patent: 5462648 (1995-10-01), Nebashi et al.
patent: 5545511 (1996-08-01), Hulderman et al.
patent: 6303042 (2001-10-01), Hawkins et al.
patent: 0 489 246 (1992-06-01), None
patent: 0 713 929 (1996-05-01), None
Chea Thorl
Eastman Kodak Company
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