Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1998-09-14
2000-12-26
Baxter, Janet
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430905, 430914, 430 9, 44346, 525282, 525205, 524532, 524553, 526281, 526280, G03C 173, G03F 7004, C08L 3500, C08L 4500, H01L 2912
Patent
active
061656720
ABSTRACT:
The present invention relates to a novel maleimide- or alicyclic olefin-based monomer, a copolymer resin of these monomers and a photoresist using the copolymer resin. The maleimide-introduced copolymer resin according to the present invention can easily be copolymerized with alicyclic olefin unit, has a physical property capable of enduring in 2.38% TMAH developer and increases adhesion of ArF or KrF photoresist. The photoresist film using a copolymer resin according to the present invention can be applied to highly integrate semiconductor devices.
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Baik Ki Ho
Bok Cheol Kyu
Jung Jae Chang
Kong Keun Kyu
Baxter Janet
Hyundai Electronics Industries Co,. Ltd.
Lee Sin J.
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