Mainshaft shield

Details Mainshaft shield Mainshaft shield

1994-06-15

1996-04-16

Anderson, Bruce C.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

2505151, H01J 37317, G21F 100

Patent

active

055085199

ABSTRACT:
A system for removal of contaminating particles from a target chamber (1) which includes a target chamber having an aperture in the floor thereof for entry of a reciprocating shaft (7) for positioning a wafer (11) within the target chamber, a seal (21) disposed at the aperture and about the shaft to seal-the interior of the target chamber from the exterior of the target chamber at the seal and a removable shield mechanism (17), preferably of polytetrafluoroethylene, disposed within the target chamber, above the seal and around the shaft to retain particles scraped from the shaft. The shield mechanism has a pocket (29) disposed over the seal and around the shaft to retain the particles therein isolated from the target chamber. The shield mechanism comprises a shield (17) disposed around the shaft and a collar (18) contacting the shield and the floor of the target chamber to form the pocket with the seal. The collar further includes a lip (16) extending toward the shaft for supporting the shield thereon.

REFERENCES:
patent: 3783405 (1974-01-01), Manoukian
patent: 4383178 (1983-05-01), Shibata et al.
patent: 4448799 (1984-05-01), Bergman et al.
patent: 4455532 (1984-06-01), Gregory et al.
patent: 4670126 (1987-06-01), Messer et al.

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