Magnetron plasma processing apparatus

Details Magnetron plasma processing apparatus Magnetron plasma processing apparatus

2010-02-12

2011-10-11

Gramaglia, Maureen (Department: 1716)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

Having glow discharge electrode gas energizing means

Reexamination Certificate

active

08034212

ABSTRACT:
A magnetron plasma processing apparatus has a baffle plate interposed between a processing space and a gas exhaust port so as to confine a plasma in the processing space in a processing chamber. The baffle plate has through holes allowing the processing space and the gas exhaust port to communicate with each other. The baffle plate is provided along lines of magnetic force of a magnetic field at a position where the plate is located.

REFERENCES:
patent: 5900103 (1999-05-01), Tomoyasu et al.
patent: 6051100 (2000-04-01), Walko, II
patent: 6190495 (2001-02-01), Kubota et al.
patent: 0 272 142 (1988-06-01), None

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