Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Patent
1989-03-27
1990-01-02
Groody, James J.
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
204298, 313161, 31323131, C23C 1500
Patent
active
048915602
ABSTRACT:
This invention discloses a magnetron plasma apparatus capable of increasing a sputtering or erosion region. Parallel magnetic fields respectively of first and second magnets having different polarities cancel each other in an ion sheath portion which is not a plasma region, so that a parallel magnetic field intensity is vertically distributed and maximized in a region having a height larger than a width of the ion sheath portion. As a result, cyclotron movement of dissociated electrons occurs in a region separated from the ion sheath portion, and a plasma density of ions is maximized in a ring of the cyclotron movement. Therefore, ions are diffused in the plasma, reach the ion sheath portion, and then are emitted onto a target, thereby increasing the sputtering or erosion region.
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Okumura Katsuya
Tezaki Atsumu
Groody James J.
Kabushiki Kaisha Toshiba
Powell Mark R.
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