Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1987-07-29
1989-06-27
Weisstuch, Aaron
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
204298, 505816, C23C 1408, C23C 1434
Patent
active
048427047
ABSTRACT:
A method for depositing and tailoring anisotropic properties of ceramic oxide superconductive films onto the outer surface of fibers, wires, rods, bars and onto the inner surface of tubes, as well as onto the surface of disc-shaped substrates, employs either tandem magnetron discharges alone or both an abnormal glow cold cathode electron gun together with tandem magnetron discharges. This deposition method provides uniform thin films having high growth rates, controllable stoichiometry and desired anisotropic microstructure. The magnetron cathodes are made from either mixtures or single elements of the metals. The oxygen component is achieved either from the cathode material itself or by reactive sputtering in an oxygen ambient or a post-deposition thermal or plasma oxidation. An external electron beam may also be used for in-situ annealing of the deposited films while placed under an external applied magnetic field to better align crystals in the films for the desired anisotropic superconducting properties. Thin metal or dielectric thin films are deposited as an interface layer and are placed both on the top of and under the metal oxide ceramic superconductive film material. Hermetic seal layers are deposited to protect the ceramic oxide superconductive films from being poisoned by foreign atoms.
REFERENCES:
patent: 4031424 (1977-06-01), Penfold et al.
patent: 4530750 (1985-07-01), Aisenberg et al.
R. Dagani, Chemical & Engineering News ("C&EN"), May 11, 1987, pp. 7-16.
M. Kawasaki et al., Jap. J. Appl. Phys., vol. 26, pp. L388-L390 (1987).
N. Terada et al., Jap. J. Appl. Phys., vol. 26, pp. L508-L509 (1987).
H. Adachi et al., Jap. J. Appl. Phys., vol. 26, pp. L709-L710 (1987).
M. Kawasaki et al., Jap. J. Appl. Phys., vol. 26, pp. L738-L740 (1987).
H. Koinuma et al., Jap. J. Appl. Phys., vol. 26, pp. L763-L765 (1987).
H. Asano et al., Jap. J. Appl. Phys., vol. 26, pp. L1221-L1222 (1987).
R. E. Somekh et al., Nature, vol. 326, pp. 857-859 (1987).
Collins George J.
McNeil John R.
Yu Zeng-gi
Hein William E.
Weisstuch Aaron
LandOfFree
Magnetron deposition of ceramic oxide-superconductor thin films does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Magnetron deposition of ceramic oxide-superconductor thin films, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Magnetron deposition of ceramic oxide-superconductor thin films will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-811234