Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1984-06-27
1985-05-07
Demers, Arthur P.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
204192R, C23C 1500
Patent
active
045156751
ABSTRACT:
A magnetron cathode for cathodic evaporation apparatus with a target holder (10) for releasably securing a plate-like target (9). The associated magnet arrangement (7) has pole faces (7c, 7d) for producing at least one circumferentially closed tunnel of magnetic field lines which overlaps the target. The magnet arrangement (7) is accommodated in a housing of non-ferromagnetic material which extends over the pole faces. To increase the utilization factor of the target material without the pole faces or housing parts participating in the atomization process,
REFERENCES:
patent: 3878085 (1975-04-01), Corbani
patent: 3956093 (1974-12-01), McCleod
patent: 4198283 (1980-04-01), Class et al.
patent: 4219397 (1980-08-01), Clarke
patent: 4247383 (1981-01-01), Greve et al.
patent: 4282083 (1981-08-01), Kertesz et al.
Deppisch Gerd
Kieser Jorg
Kukla Reiner
Demers Arthur P.
Leybold-Heraeus GmbH
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